Garment Pattern & Sampling

12 weeks · 0 milestones

Pattern construction and physical or digital garment sampling for at least one garment design. Triad: concept/ideation artifact (annotated pattern with construction notes: seam allowances, grainlines, notches, and construction sequence — not just the pattern pieces but the logic for using them), technical execution artifact (physical calico toile showing fit, construction, and proportion on a body or dress stand, or a digital simulation in CLO3D, Marvelette, or Browzwear showing equivalent garment construction and fit), documentation/critique artifact (fit development record: photographs of the toile or digital simulation at each development stage, fit issues identified, adjustments made with rationale, and final resolution). Proof Accessibility Rule applies: CLO3D free education licence, Valentina free open-source pattern software, or Marvelette trial are accessible digital alternatives to physical toile — both produce real artifacts of equivalent rigor. Studio critique: fashion design tutor reviews the sample against specification and challenges construction decisions. Proof: annotated pattern, toile photographs or digital simulation screenshots, fit development record, critique notes. Verifier: fashion design tutor or garment technologist — no peer-only verification.

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